Crosstalk-Affected Propagation Delay in Nanometer Technologies
نویسندگان
چکیده
This paper presents a detailed analysis of the crosstalk-affected delay of coupled interconnects considering process variations. We utilize a distributed RC- model of the interconnections to accurately model process variations. In particular, we perform a detailed investigation of various crosstalk scenarios and study the impact of different parameters on crosstalk delay. While accounting for the effect of correlations among parameters of the neighboring wire segments, statistical properties of the crosstalk-affected propagation delays are characterized and discussed. Monte Carlo-based simulations using Spice demonstrate the effectiveness of the proposed approach in accurately modeling the correlation-aware process variations and their impact on interconnect delay in the presence of crosstalk.
منابع مشابه
Test-Pattern Grading and Pattern Selection for Small-Delay Defects1,2
Timing-related defects are becoming increasingly important in nanometer technology designs. Small delay variations induced by crosstalk, process variations, powersupply noise, as well as resistive opens and shorts can potentially cause timing failures in a design, thereby leading to quality and reliability concerns. We present a testgrading technique to leverage the method of output deviations ...
متن کاملTough Challenges as Design and Test Go Nanometer - Guest Editors' Introduction
Rohit Kapur Thomas W. Williams Synopsys Inc. P lay the word association game with electronics, and the first words that come to mind might be “inexpensive” and “reliable.” Everyone expects electronic items to become continually less expensive and quickly outdated. We also expect them to work when we bring them home. Do any of us ever question how and why this happens? A large part of the answer...
متن کاملQuantitative Prediction of On-Chip Capacitive and Inductive Crosstalk Noise and Tradeoff between Wire Cross-Sectional Area and Inductive Crosstalk Effect
Capacitive and inductive crosstalk noises are expected to be more serious in advanced technologies. However, capacitive and inductive crosstalk noises in the future have not been concurrently and sufficiently discussed quantitatively, though capacitive crosstalk noise has been intensively studied solely as a primary factor of interconnect delay variation. This paper quantitatively predicts the ...
متن کاملTest-Pattern Selection for Screening Small-Delay Defects in Very-Deep Submicron Integrated Circuits
Timing-related defects are major contributors to test escapes and in-field reliability problems for very-deep submicron integrated circuits. Small delay variations induced by crosstalk, process variations, power-supply noise, as well as resistive opens and shorts can potentially cause timing failures in a design, thereby leading to quality and reliability concerns. We present a test-grading tec...
متن کاملMonte Carlo Analysis of Propagation Delay Deviation due to Process Induced Line Parasitic Variations in Global VLSI Interconnects
Process variation has recently emerged as a major concern in the design of circuits including interconnect in current nanometer regime. Process variation leads to uncertainties of circuit performances such as propagation delay. The performance of VLSI/ULSI chip is becoming less predictable as MOSFET channel dimensions shrinks to nanometer scale. The reduced predictability can be ascribed to poo...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
دوره شماره
صفحات -
تاریخ انتشار 2012